The SPECTRO ARCOS ICP-OES excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.
Its unique new MultiView plasma interface option provides truly uncompromising axial-view and radial-view plasma observation in a single instrument. The periscope-free MultiView mechanism lets an operator literally "turn" a radial-view instrument into an axial-view device, or vice-versa, in 90 seconds or less. Visit the MultiView Q&A section in the ARCOS Resource Center for answers to frequently asked questions.
Plasma power enters a whole new era with the system’s innovative generator. This unique, compact and extremely rugged component is based on laterally diffused metal oxide semiconductor (LDMOS) technology. It delivers the highest plasma power available today, enabling previously impossible feats of analysis at the highest plasma loads.
The design of the SPECTRO ARCOS ensures exceptionally low operating costs over a long, reliable service life. And it packs a modern, ergonomic chassis with proven features such as no-purge UV-PLUS sealed gas purification technology, no-external-cooling OPI-Air interface, simplified sample introduction, and easy accessibility for service and maintenance. Finally, SPECTRO ARCOS delivers superior optical performance, without any need for added techniques or instruments.
Additional ICP-OES / ICP-AES instruments in SPECTRO’S comprehensive product line include SPECTROBLUE and SPECTRO GENESIS.