The new SPECTRO ARCOS ICP-OES analyzer represents a new pinnacle of productivity and performance for inductively coupled plasma optical emission spectrometers


    • One instrument instead of two: Only MultiView plasma instrument in the market ‒ true axial AND true radial plasma observation in a single instrument
    • ORCA Optical System: Simultaneous spectrum capture in the 130-770 nm wavelength range with up to 5x more sensitivity than Echelle based systems - delivers best in class performance in the UV/VUV range
    • LDMOS Generator: Up to 2000 W power and robust enough to handle volatile organics and high dissolved solids with ease

    The SPECTRO ARCOS ICP-OES excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials.

    The periscope-free MultiView mechanism lets an operator literally "turn" a radial-view instrument into an axial-view device, or vice-versa, in 90 seconds or less. Visit the MultiView Q&A section in the ARCOS Resource Center for answers to frequently asked questions. 

    The design of the SPECTRO ARCOS ensures exceptionally low operating costs over a long, reliable service life. And it packs a modern, ergonomic chassis with proven features such as no-purge UV-PLUS sealed gas purification technology, no-external-cooling OPI-Air Interface.

    Additional ICP-OES / ICP-AES instruments in SPECTRO’S comprehensive product line include SPECTROBLUE and SPECTRO GENESIS.


    Which plasma interface is best for your research: Axial-View, Radial View, Dual-View, or new MultiView?

    Which ICP-OES optical technology offers superior performance: Echelle or ORCA?

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    Watch video demonstrations of the SPECTRO ARCOS – or click here to switch to SPECTRO on YouTube.com.




    Application Reports


    Click on the link below to further explore the SPECTRO ARCOS.